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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Appl

Description: payment | shipping rates | returns Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology) Product Category : Books ISBN : 9780815512882 Title : Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology) EAN : 9780815512882 Authors : Schmitz, John E.J. Binding : Hardcover Publisher : William Andrew Publication Date : 1993-01-14 Pages : 251 Signed : False First Edition : False Dust Jacket : False List Price (MSRP) : 72.95 Height : 0.8661 inches Width : 6.4567 inches Length : 9.2913 inches Weight : 1.1905 pounds Condition : Good About hpb-red Selling quality books and media since 1972. Customer service is our top priority! Payment We accept several payment types. They are shown above. Shipping Please click the "Shipping and Payments" tab above for details. Returns Your satisfaction is very important to us. Please contact us via the methods available within eBay regarding any problems before leaving negative feedback. You have 60 days from purchase to request a refund. © 2024 hpb-red

Price: 26.3 USD

Location: Carrollton, Texas

End Time: 2024-12-02T21:36:06.000Z

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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Appl

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Restocking Fee: No

Return shipping will be paid by: Buyer

All returns accepted: Returns Accepted

Item must be returned within: 60 Days

Refund will be given as: Money Back

Author: Schmitz, John E.J.

Book Title: Chemical Vapor Deposition of Tungsten and Tungsten Silicides for

Language: English

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